Ed million test developed the inspection of the optical mask defect test Scanning electron microscope system E5610

Ed million test (Advantest) announced the development of a new mask defect inspection Scanning electron microscope system E5610, not only to detect the light mask substrate ultra-fine defects, but also to classify.

E5610 inherited advantest consistent high stability, automatic image capture technology, with its very positive multi-angle measurement scanning electron microscope detection of mask defects, and provide a new development of the beam tilt function to tilt the angle of the scan. E5610 's defect inspection features high accuracy and high productivity, which will improve the quality of the next generation of light mask products and shorten the manufacturing cycle.

The light cover process does not allow for any major defects, as this will not only reduce the yield but also affect the process cycle time. Advantest Brand new E5610 is an indispensable solution for the light cover process plant, its rapid and accurate technology can classify defects, and determine the appropriate repair mode according to the defect category, and achieve the good rate goal within the established process cycle time.

Advantest has patented progressive-line architecture technology, even under the low speed of the light mask scanning, can allow the resolution of the space to reach 2nm level. In addition, E5610 also offers a unique electronic control tilt module, which allows the beam to rise 15 degrees, making it easier to perform 3D defect testing.

E5610 because of its high-precision positioning platform, charge control function, reduce pollution technology, even in the scanning electron microscope height amplification of the situation, can still show high efficiency, stable automatic defect radiography.

The E5610 is compatible with the main optical mask inspection system. It can import defect location data and automatically position radiography, and support the industry standard KLARF (KLA result file) format.

E5610 provides an EDS (X-Ray Spectrum Distribution Analyzer) selection module, which can be used to analyze the basic cost, which is an advanced technology corresponding to the defects of the light cover substrate.